Plasmoteg
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plasma source, pulsed, cathodic-ARC


Destination

The plasma source is designed for deposition of thin films and coatings in vacuum or in reactive gas atmosphere. Ion source can be used for sputtering of various metals including high-melting metals, for deposition of composite coatings of  TiN, ZrN TiAlN, WC type and other carbides, oxides and their compositions. It can be also used for obtaining hydrogen-free superhard and biologically compatible diamond-like coatings on metallic and dielectric surfaces. The temperature of coated items is less than 100 °C.

Specification:
voltage200… 400 V
discharge current2000… 4000 A
pulse frequency1… 30 Hz
cathode diameter30 mm
deposition rate:
for metls5 nm/min
for carbon200 nm/min
weight15 kg
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